Mechanical characterization of sub-micron polytetrafluoroethylene (PTFE) thin films

Book · Thu Dec 31 04:00:00 EST 1998

OSTI ID:305507

Lucas, B N; Oliver, W C ^[1]; Rosenmayer, C T ^[2]

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1. Nano Instruments, Inc., Oak Ridge, TN (United States)
2. W.L. Gore and Associates, Inc., Eau Claire, WI (United States)

This study reports the results of an investigation of the mechanical properties of polytetrafluoroethylene (PTFE) thin films on silicon substrates in the 0.5 to 15 {micro}m thickness regime using frequency specific depth-sensing indentation. All measurements were conducted at an excitation frequency of 45 Hz using a constant (1/P dP/dt) load ramp of 0.1 s{sup {minus}1}. The modulus of the PTFE at a depth of 5% of the film thickness was measured to be approximately 1 GPa ({nu} = 0.46) independent of film thickness. These values are somewhat higher than the values obtained from free-standing 15 {micro}m film measurements of 0.4 GPa for the tensile modulus and 0.49 GPa for the storage modulus {at} 1.1 Hz. The film hardness at these depths was observed to range between 30 and 55 MPa with no correlation observed between the hardness and respective film thickness. While reliability modeling for interconnects currently uses interlayer dielectric mechanical properties data determined from free-standing films with thicknesses of several microns, these in-situ results should more closely mimic the constrained deformation that occurs during service and perhaps lead to a better understanding of the electromigration resistance of PTFE.

• OSTI ID: 305507
• Report Number(s): CONF-971201--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DEFORMATION
EXPERIMENTAL DATA
MECHANICAL PROPERTIES
MECHANICAL TESTS
POLYTETRAFLUOROETHYLENE
THIN FILMS