Si texturing with sub-wavelength structures

Conference · Wed Dec 31 04:00:00 EST 1997

OSTI ID:302462

Zaidi, S H; Brueck, S R.J. ^[1]

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1. Univ. of New Mexico, Albuquerque, NM (United States). Center for High Technology Materials

Si surface reflection has been investigated with textured structures smaller than the optical wavelengths. This physical optics approach relies on absorption through a wave-guide mechanism, and has been realized for both uniform and random structures. Laser interferometric lithography techniques have been combined with conventional wet and reactive ion etching of Si to form a wide range of nanoscale 1-D and 2-D structures in both single poly-crystalline Si substrates. Maskless reactive ion etching of Si has also been employed to form highly absorptive nanoscale structures. For identically etched structures, uniform structures showed an order of magnitude smaller reflectance than random structures.

• OSTI ID: 302462
• Report Number(s): CONF-970953--
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
36 MATERIALS SCIENCE
ETCHING
MICROSTRUCTURE
REFLECTIVITY
SILICON
SILICON SOLAR CELLS
SURFACE PROPERTIES
TEXTURE