Implementation of hydrogen passivation in an industrial low-cost multicrystalline silicon solar cell process
- Univ. of Konstanz (Germany). Faculty of Physics
- Eurosolare, Nettuno (Italy)
The aim of this study was the incorporation of the microwave induced remote hydrogen plasma (MIRHP) passivation into a screen-printed solar cell process using different multicrystalline silicon base materials (BAYSIX (Bayer), Eurosil (Eurosolare), EMC (Sumitomo Sitix)). MIRHP before cell metallization including an antireflection coating (APCVD TiO{sub 2} or PECVD SiN) as capping layer to avoid the out-diffusion of hydrogen during contact firing as well as the MIRHP after cell metallization on uncoated cells have been investigated. As a reference solar cells were processed without a MIRHP passivation. Using a PECVD Sin ARC on high quality material such as EUROSIL and BAYSIX an increase in the short circuit current density of 0.7 mAcm{sup {minus}2} and in the open circuit voltage of 3--4 mV have been observed by comparing cells with and without MIRHP. Using an APCVD TiO{sub 2} ARC on solar cells based on EMC resulted in an increase in the short circuit current density of 0.7 mAcm{sup {minus}2} due to the MIRHP.
- OSTI ID:
- 302457
- Report Number(s):
- CONF-970953--
- Country of Publication:
- United States
- Language:
- English
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