Growth and structure of nanometric iron oxide films

Book · Thu Dec 31 04:00:00 EST 1998

OSTI ID:302393

Guiot, E; Gota, S; Henriot, M; Gautier-Soyer, M ^[1]; Lefebvre, S ^[2]

---

1. CEA SACLAY, Gif sur Yvette (France)
2. Centre Univ. Paris Sud, Orsay (France)

Nanometric films of iron oxides (Fe{sub 3}O{sub 4}, {alpha} and {gamma} Fe{sub 2}O{sub 3}) of high crystalline order and purity are epitaxially grown on {alpha}-Al{sub 2}O{sub 3}(0001) by atomic oxygen assisted MBE. A complete characterization of the films structure has been performed by in situ LEED and RHEED, and ex situ GIXRD using synchrotron radiation. The films grown at room temperature and post annealed at 400 C and 700 C (p{sub O{sub 2}} = 10{sup {minus}6} Torr) are respectively metastable {gamma}-Fe{sub 2}O{sub 3} (111) and {alpha}-Fe{sub 2}O{sub 3} (0001). For a substrate temperature of 450 C during growth, Fe{sub 3}O{sub 4} (111) is directly obtained. GIXRD shows an in-plane expansion of the films, which decreases with thickness (0.8 and 0.2% for film thickness of 20 and 80 {angstrom}, respectively).

• OSTI ID: 302393
• Report Number(s): CONF-980405--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
66 PHYSICS
CRYSTAL STRUCTURE
ELECTRON DIFFRACTION
EXPERIMENTAL DATA
IRON OXIDES
MICROSTRUCTURE
MOLECULAR BEAM EPITAXY
SYNCHROTRON RADIATION
X-RAY DIFFRACTION