Numerical design considerations for vapor transport deposition of metal-halide perovskite thin films

Hsu, Wan-Ju; Wassweiler, Ella L.; Pettit, Emma C.; Bulović, Vladimir; Holmes, Russell J.

doi:10.1063/5.0259227

Numerical design considerations for vapor transport deposition of metal-halide perovskite thin films

Journal Article · Tue May 06 00:00:00 EDT 2025 · Applied Physics Letters

DOI:https://doi.org/10.1063/5.0259227· OSTI ID:2997613

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University of Minnesota, Minneapolis, MN (United States)
Massachusetts Institute of Technology, Cambridge, MA (United States)

While metal-halide perovskites (MHPs) offer high efficiency and potential application in single junction and tandem solar cells, challenges remain in translating solution-based methods to commercial-scale production. Vapor transport deposition (VTD) offers advantages such as precise control over film composition and purity, as well as the possibility of achieving high thin film deposition rates for scale-up. In this work, a numerical model is developed to simulate the deposition process, analyzing the impact of parameters including source material temperature, carrier gas and dilution gas flow rates, and chamber pressure to optimize deposition rates and film uniformity. Geometrical parameters, such as throw distance, are also found to significantly affect rate and uniformity. Furthermore, the modeling results presented here offer valuable insight for improving the scalability of VTD for the processing of metal-halide perovskites.

View Accepted Manuscript (DOE)

Research Organization:: University of Minnesota, Minneapolis, MN (United States)

Sponsoring Organization:: USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office

Grant/Contract Number:: EE0009514

OSTI ID:: 2997613

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 18 Vol. 126; ISSN 1077-3118; ISSN 0003-6951

Publisher:: AIP PublishingCopyright Statement

Country of Publication:: United States

Language:: English

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Numerical design considerations for vapor transport deposition of metal-halide perovskite thin films

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