Dopant induced ablation of poly(methyl methacrylate) at 308 nm
- Los Alamos National Laboratory, CST-6, MS J 585, Los Alamos, New Mexico 87545 (United States)
- Department of Physics, Pacific Union College, Angwin, California 94508 (United States)
- Department of Physics, Washington State University, Pullman, Washington 99164-2814 (United States)
Poly(methyl methacrylate) (PMMA) is highly resistant to laser ablation at 308 nm. Either very high fluences or absorbing dopants must be used to ablate PMMA efficiently at this wavelength. We investigate two dopants, pyrene and a common solvent, chlorobenzene, using time-of-flight mass spectroscopy. Both compounds improve the ablation characteristics of PMMA. For both dopants, the first step in ablation is an incubation process, in which absorption at 308 nm increases due to the production of C{double_bond}C bonds along the polymer backbone. Incubation at 308 nm is similar to that observed for shorter ultraviolet wavelengths in previous studies. The principal ablation products and their corresponding temperatures are consistent with a photothermal ablation mechanism. {copyright} {ital 1999 American Institute of Physics.}
- OSTI ID:
- 295505
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 3 Vol. 85; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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