Epitaxial thin film growth of lanthanum and neodymium aluminate films on roll-textured nickel using a sol-gel method
- Oak Ridge National Lab., TN (United States)
As part of an effort to develop a new, non-vacuum-processed substrate for high current superconducting films, thin films of LaAlO{sub 3} and NdAlO{sub 3} were deposited on biaxially textured (100) nickel substrates using a solution deposition technique. On heating to 1150 C in Ar-4% H{sub 2} for 1 h, epitaxial films were obtained. Out-of-plane alignment was confirmed by obtaining rocking curves of the (002) plane of the LaAlO{sub 3} (full width at half-maximum (fwhm) = 7.2{degree}) and the NdAlO{sub 3} (fwhm = 5.8{degree}) films. In-plane alignment was demonstrated by obtaining phi scans of the (110) plane of the LaAlO{sub 3} (fwhm = 13.4{degree}) and the NdAlO{sub 3} (fwhm = 8.8{degree}) films. Grain alignment in the films is approximately equivalent to the alignment of the Ni substrate. Analysis of pole figures indicated that in both films there are two-in-plane orientations present, the major being (001)[100] and the minor (001)[110].
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 289480
- Journal Information:
- Journal of the American Ceramic Society, Vol. 81, Issue 11; Other Information: PBD: Nov 1998
- Country of Publication:
- United States
- Language:
- English
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