Large-area diamond deposition in an atmospheric pressure stagnation-flow reactor
- Sandia National Laboratories, Livermore, California 94551-0969 (United States)
We present the results of large-area (20 cm{sup 2}) diamond deposition from a scaled-up stagnation-flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene{endash}oxygen{endash}hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 {mu}m/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro-Raman spectroscopy. {copyright} {ital 1996 American Institute of Physics.}
- OSTI ID:
- 282102
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 15 Vol. 68; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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