Texture in magnetic annealed Terfenol-D films

Journal Article · Mon Apr 01 04:00:00 EST 1996 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.361869· OSTI ID:282080

Loveless, M; Guruswamy, S ^[1]

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1. Department of Metallurgical Engineering, University of Utah, Salt Lake City, Utah 84112 (United States)

The paper will present an approach to obtaining (111) textured Terfenol-D films suitable for use in magnetostrictive devices. Amorphous thin films of Terfenol-D were rf magnetron sputter deposited on (100) silicon single crystal substrates. A composite target was used to obtain the Terfenol-D films. Samples were subsequently annealed in the range of 300 to 600{degree}C in the presence of a 2000 Oe magnetic field for times of 15 min to 1 h. X-ray diffraction studies were performed using a Siemens D5000 diffractometer to examine the changes in the preferred crystalline orientation in films with changes in annealing time, annealing temperature, and field orientation. The magnetic properties were examined using a Micromag 2900 alternating gradient magnetometer. Magnetic annealing at 450{degree}C showed the best combination of magnetic properties. The films exhibited in-plane {ital H}{sub {ital c}} values in the range of near zero to 350 Oe and {ital M}{sub {ital s}} values in the range of 200 to 550 emu/cc. {copyright} {ital 1996 American Institute of Physics.}

• OSTI ID: 282080
• Report Number(s): CONF-951101--
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 79; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
DYSPROSIUM ALLOYS
IRON ALLOYS
MAGNETIC MATERIALS
MAGNETIC PROPERTIES
SPUTTERED MATERIALS
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0400-1000 K
TERBIUM ALLOYS
TEXTURE
THIN FILMS
X-RAY DIFFRACTION