Photochemistry of group V ethyl-containing systems: Enhancing H-atom production via 248-nm ethyl radical photolysis

Journal Article · Thu Aug 20 00:00:00 EDT 1992 · Journal of Physical Chemistry

DOI:https://doi.org/10.1021/j100196a038· OSTI ID:281160

Xu, Xiaodong; Wang, Zhongrui; Brum, J L; Yen, Yu-Fong; Deshmukh, S; Koplitz, B ^[1]

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1. Tulane Univ., New Orleans, LA (United States)

The authors report on the photolysis of triethylarsenic, monoethylamine, and monoethylarsine with respect to H-atom formation. For all three molecules, 193-nm excitation followed by a 248-nm laser pulse produces an H-atom signal that is enhanced relative to the signal derived from the sum of the two lasers operating alone. The use of the selectively-deuterated compounds C{sub 2}D{sub 5}NH{sub 2} and C{sub 2}H{sub 5}ND{sub 2} clearly demonstrates that significant H-atom enhancement occurs via the ethyl group, at least in the case of monoethylamine. The importance of such photolysis reactions is discussed in terms of the laser-enhanced growth of III-V semiconductor materials. 19 refs., 5 figs.

• Sponsoring Organization: USDOE
• OSTI ID: 281160
• Journal Information: Journal of Physical Chemistry, Vol. 96, Issue 17; Other Information: PBD: 20 Aug 1992
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
36 MATERIALS SCIENCE
ETHYL RADICALS
PHOTOLYSIS
ORGANIC ARSENIC COMPOUNDS
AMINES
SEMICONDUCTOR MATERIALS