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Kinetic and ab initio theoretical study of hydrogen atom abstraction from thiols by thiyl radicals: Basis rate expressions for reactions of sulfur-centered radicals

Journal Article · · Journal of Physical Chemistry
; ; ; ;  [1]
  1. Pacific Northwest Laboratory, Richland, WA (United States)
Arrhenius rate expressions were determined for the abstraction of hydrogen atom from thiophenol and hexanethiol by the octanethiyl radical at 25-100 {degrees}C in nonane. Octanethiyl radicals were produced by steady-state photolysis of octyl thiobenzoate. Analysis of octyl disulfide and octanethiyl radical. For hexanethiol, log (k{sub abs}/K{sub t}{sup 1/2}) = (2.94 {plus_minus} 0.29) - (3.84 {plus_minus}0.41)/0, and for thiophenol, log (k{sub abs}/k{sub 5}{sup 1/2}) = (2.56 {plus_minus} 0.19) - (2.88 {plus_minus} 0.28)/0;0=2.3RT kcal/mol. Combining these expressions with the Smoluchowski expression for self-termination of octanethiyl in nonane, log (k{sub t}{sup 1/2}) = 5.96 - 1.335/0, which employs experimental diffusion coefficients of octanethiol and a spin selection factor {sigma} = 1, yields, for thiophenol, log (k{sub abs}/M{sup {minus}1}s{sup {minus}1}) = (8.52 {plus_minus} 0.18) = (4.22 {plus_minus} 0.27)/0, and for hexanethiol, log (k{sub abs}/M{sup {minus}1} s{sup {minus}1}) = (8.90 {plus_minus} 0.29) = (5.18 {plus_minus} 0.41)/0 (errors are 2{sigma}). The rate of disappearance of octanethiyl/diphenylketyl radical pairs in SDS micelles, determined by nanosecond optical spectroscopy, was found to be unchanged in a 700-G magnetic field, providing evidence for rapid intersystem crossing of sulfur-centered radical pairs and support for the assignment of {sigma} = 1 above. Ab initio electronic structure calculations on the reaction HS{sup {lg_bullet}} + HSH {r_arrow} HSH + {sup {lg_bullet}}SH, performed at SCF and correlated levels, predict an activation barrier of {Delta}H{sub 298} {sup {double_dagger}}= 4.6 kcal/mol, in close agreement with the experimental barrier for the octanethiyl + hexanethiol reactions. 43 refs., 5 figs., 4 tabs.
Sponsoring Organization:
USDOE
OSTI ID:
281159
Journal Information:
Journal of Physical Chemistry, Journal Name: Journal of Physical Chemistry Journal Issue: 17 Vol. 96; ISSN JPCHAX; ISSN 0022-3654
Country of Publication:
United States
Language:
English

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