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Novel process for the production of large, stable photosensitivity in glass films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.115621· OSTI ID:279720
; ; ;  [1]
  1. Sandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185-1423 (United States)

Germanosilicate glasses exhibit a significant photosensitive response which has been linked to the presence of oxygen-deficient germanium point defects in the glass structure. Based on this correlation, a process which produces highly photosensitive thin films without the use of hydrogen exposures, has been developed. This process, applicable to a wide range of desired {ital x}GeO{sub 2}:{ital bf}{gt}(1{minus}{ital x})SiO{sub 2} film composition, uses reactive atmosphere sputtering and allows extensive control of the degree of oxidation of the films during synthesis to produce dramatic demonstrations of photosensitivity. In preliminary tests, our films demonstrated ultraviolet-induced refractive index perturbations ({Delta}{ital n}) of up to {minus}4{times}10{sup {minus}3} in the visible and {minus}0.4{times}10{sup {minus}3} at 1.5 {mu}m. Since no hydrogen exposure was necessary, this process yielded stable films which retained their predisposition for large photosensitivity for over one year of storage.

Research Organization:
Sandia National Laboratory
DOE Contract Number:
AC04-94AL85000
OSTI ID:
279720
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 14 Vol. 68; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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