Dynamic laser light scattering studies of dusty plasmas in the Gaseous Electronics Conference Reference Cell
- Department of Chemical and Nuclear Engineering, The University of New Mexico, Albuquerque, New Mexico 87131 (United States)
Particle generation has been studied during reactive ion etching of oxide wafers in CF{sub 4}/CHF{sub 3} plasmas using the Gaseous Electronics Conference Reference Cell. Under certain discharge process conditions, copious amounts of submicron particles form due to plasma interactions with the oxide substrate. Particles were observed {ital in} {ital situ} by laser light scattering and dynamic laser light scattering (DLLS). DLLS can be used to determine information about particle size, motion, and growth dynamics. DLSS measurements show process-induced dust particles confined in an electrostatic trap exhibit low-frequency oscillatory motion consistent with charge-density-wave motion. These results are also consistent with the plasma dust particles forming a strongly coupled Coulomb liquid phase. {copyright} {ital 1996 American Vacuum Society}
- OSTI ID:
- 279576
- Report Number(s):
- CONF-9510236--
- Journal Information:
- Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 2 Vol. 14; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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