Beam emittance measurements on multicusp ion sources
- Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720 (United States)
Multicusp ion sources are used for various applications. Presently, the implementation of this type of ion source is planned for the development of an ion beam lithography machine, which will be used for the projection of sub-0.2 {mu}m patterns onto a wafer substrate. Since, for this application, a very good beam quality and a small ion energy spread are required, emittance measurements have been performed on a multicusp ion source for various source conditions. It is shown that the installation of proper capacitors between the extraction electrodes is necessary to avoid rf pickup, which otherwise leads to a distortion of the beam emittance. The influence of the magnetic filter field on the beam emittance has been investigated, and the beam emittance of a dc filament-discharge plasma has also been compared to that of a rf-generated plasma. {copyright} {ital 1996 American Institute of Physics.}
- Research Organization:
- Lawrence Berkeley National Laboratory
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 279253
- Report Number(s):
- CONF-9509125--
- Journal Information:
- Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 3 Vol. 67; ISSN 0034-6748; ISSN RSINAK
- Country of Publication:
- United States
- Language:
- English
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