Negative ion production in large volume source with small deposition of cesium

Journal Article · Fri Mar 01 04:00:00 EST 1996 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1146750· OSTI ID:279235

Jacquot, C; Pamela, J; Riz, D ^[1]; Belchenko, Y ^[2]

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1. CEN Cadarache, 13155 St. Paul lez Durance (France)
2. Budker Institute of Nuclear Physics, Novosibirsk (Russia)

Experimental data on the enhancement of D{sup {minus}} (H{sup {minus}}) negative ion production due to cesium injection into a large volume multiampere negative ion source (MANTIS) are described. The directed deposition of small cesium amounts (5{endash}100 mg) from a compact, movable oven, placed into the central part of a MANTIS gas-discharge box was used. A calorimetrically measured D{sup {minus}} beam with an intensity up to 1.6 A and an extracted current density up to 4.2 mA/cm{sup 2} (beam energy 25 kV) was obtained. Exactly 30 mg of cesium provides at least one month of source operation (1000 pulses with a discharge pulse duration of 4 s). The effect of cesium on NI enhancement was immediately displayed after the distributed Cs deposition, but it needed some {open_quote}{open_quote}conditioning{close_quote}{close_quote} of cesium by tens of discharge pulses (or by several hours {open_quote}{open_quote}pause{close_quote}{close_quote}) in the case of a localized Cs deposition. No degradation of extraction-acceleration voltage holding on within the tested range of cesium injection was observed. {copyright} {ital 1996 American Institute of Physics.}

• OSTI ID: 279235
• Report Number(s): CONF-9509125--
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 3 Vol. 67; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ANIONS
BEAM CURRENTS
BEAM EXTRACTION
BEAM PRODUCTION
CESIUM
DEUTERIUM IONS
ELECTRIC DISCHARGES
HYDROGEN IONS
ION SOURCES
KEV RANGE 10-100