skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Upper limit on the formation of NO(X{sup 2}{Pi}{sub r}) in the reactions N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O({sup 3}P) and N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O{sub 2}(X{sup 3}{Sigma}{sup -}{sub g}) at 298 K

Journal Article · · Journal of Physical Chemistry
DOI:https://doi.org/10.1021/jp960164v· OSTI ID:263207
;  [1]
  1. Orion International Technologies, Hanscom AFB, MA (United States)

The concentration of the product nitric oxide, [NO(X{sup 2}{Pi}{sub r})]{sub product}, formed in the title reactions is measured as a function of the vibrational energy distribution in the N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) for v` >= 6 in a rapidly pumped discharge-flow reactor at nearly 298 K and a total pressure of nearly 2 Torr using laser-excited fluorescence techniques. For the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}, v` >= 2) + O({sup 3}P) there is no [NO(X{sup 2}{Pi}{sub r})]{sub observed} detected above the noise in the background emission signal. Correcting this null measurement for competing reactions, the NO(X{sup 2}{Pi}{sub r}) + N({sup 4}S,{sup 2}D) product yield accounts for >=2% (signal-to-background noise = 1, 1{sigma}) of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v`)]{sub total}. For the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v` >= 6) + O({sup 3}P) the [NO(X{sup 2}{Pi}{sub r})]{sub observed} is seen to increase slightly relative to the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v` >= 2) + O({sup 3}P). Correcting the [NO(X{sup 2}{Pi}{sub r})]{sub observed} for competing reactions, the NO(X{sup 2}{Pi}{sub r}) + N({sup 4}S,{sup 2}D) product yield accounts for 5.7{+-}1.1% of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u})]{sub total} and as much as 57{+-}14% of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}, 3 >= v`>= 6)]. 65 refs., 3 figs., 4 tabs.

OSTI ID:
263207
Journal Information:
Journal of Physical Chemistry, Vol. 100, Issue 21; Other Information: PBD: 23 May 1996
Country of Publication:
United States
Language:
English