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Intercalation induced quasi-freestanding layer in TiSe2

Journal Article · · Physical Review B
DOI:https://doi.org/10.1103/jvm3-l8d2· OSTI ID:2589358
 [1];  [2];  [3];  [3];  [4];  [4];  [3]
  1. Xiamen Univ. Malaysia, Sepeng (Malaysia); Univ. of Connecticut, Storrs, CT (United States)
  2. Xiamen Univ. Malaysia, Sepeng (Malaysia)
  3. Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)
  4. Xiamen Univ. (China); Xiamen Univ. Malaysia, Sepeng (Malaysia)
Angle-resolved photoemission spectroscopy is employed to study the electronic structure of bulk TiSe2 before and after doping with potassium impurities. A splitting in the conduction band into two branches is observed after room-temperature deposition. The splitting energy increases to approximately 130 meV when the sample is cooled to 40 K. One branch exhibits a nondispersive two-dimensional feature, while the other shows the characteristics of three-dimensional bulk band dispersion. Core-level spectroscopy suggests that the K impurities predominantly occupy the intercalated sites within the van der Waals gap. Furthermore, the results indicate the formation of a quasi-freestanding TiSe2 layer. Additionally, doping completely suppresses the periodic lattice distortion in the surface region. These findings are further supported by density functional theory calculations, which compare the band structure of monolayer and bulk TiSe2 with experimental data. Thus, the dimensional and intrinsic electronic properties of 1⁢𝑇−TiSe2 can be controlled through the intercalation procedure used in this work.
Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF); Xiamen University Malaysia
Grant/Contract Number:
SC0012704
OSTI ID:
2589358
Report Number(s):
BNL--228953-2025-JAAM
Journal Information:
Physical Review B, Journal Name: Physical Review B Journal Issue: 8 Vol. 112; ISSN 2469-9950; ISSN 2469-9969
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English

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