High-Power Impulse Magnetron Sputter Deposition of Ultrathick Amorphous Carbon

Engwall-Holmes, A. M.; Bayu Aji, L. B.; Shin, S. J.; Merlo, J. B.; Bae, J. H.; Kucheyev, S. O.

doi:10.1080/15361055.2025.2502890

High-Power Impulse Magnetron Sputter Deposition of Ultrathick Amorphous Carbon

Journal Article · Mon Aug 04 00:00:00 EDT 2025 · Fusion Science and Technology

DOI:https://doi.org/10.1080/15361055.2025.2502890· OSTI ID:2589243

^[1]; Bayu Aji, L. B. ^[1]; ^[1]; Merlo, J. B. ^[1]; Bae, J. H. ^[2]; Kucheyev, S. O. ^[1]

Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
General Atomics, San Diego, CA (United States)

Diamond-like carbon (DLC) is a material of interest for inertial confinement fusion (ICF) ablators. However, the deposition of ultrathick DLC coatings, as required for ICF ablator fabrication, remains a challenge. Here, in this study, we use high-power impulse magnetron sputtering to deposit DLC and demonstrate a set of process parameters leading to high-purity, amorphous DLC coatings with a low compressive residual stress of <400 MPa. Coatings with thicknesses of up to 80 μm are demonstrated.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: AC52-07NA27344; 89233119CNA000063

OSTI ID:: 2589243

Journal Information:: Fusion Science and Technology, Journal Name: Fusion Science and Technology; ISSN 1943-7641; ISSN 1536-1055

Publisher:: Informa UK LimitedCopyright Statement

Country of Publication:: United States

Language:: English

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coatings
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magnetron sputtering

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