Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success

Welch, Brian C.; Casetta, Jeanne; Pathak, Rajesh; Elam, Jeffrey W.; Pochat-Bohatier, Céline; Miele, Philippe; Segal-Peretz, Tamar

doi:10.1116/6.0004187

Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success

Journal Article · Wed Jan 22 00:00:00 EST 2025 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/6.0004187· OSTI ID:2561418

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Technion-Israel Institute of Technology, Haifa (Israel); Argonne National Laboratory (ANL), Argonne, IL (United States)
Univ. Montpellier (France). Institut Européen des Membranes
Argonne National Laboratory (ANL), Argonne, IL (United States)
Technion-Israel Institute of Technology, Haifa (Israel)

Atomic layer deposition (ALD) is a versatile technique for engineering the surfaces of porous polymers, imbuing the flexible, high-surface-area substrates with inorganic and hybrid material properties. Previously reported enhancements include fouling resistance, electrical conductance, thermal stability, photocatalytic activity, hydrophilicity, and oleophilicity. However, there are many poorly understood phenomena that introduce challenges in applying ALD to porous polymers. In this paper, we address five common challenges and ways to overcome them: (1) entrapped precursor, (2) embrittlement, (3) film fracture, (4) deformation, and (5) pore collapse. These challenges are often interrelated and can exacerbate one another. To investigate these phenomena, we applied various ALD chemistries to porous polymers including polyethersulfone, polysulfone, polyvinylidene fluoride, and polycarbonate track-etched membranes. Reaction-diffusion modeling revealed why certain precursors and processing conditions result in embrittling subsurface material growth, entrapment of unreacted precursors, and nongrowth. We quantify the limits of ALD processing temperatures that are dictated by thermal expansion mismatch and can lead to fractured ALD films. The results herein allow us to make recommendations to avoid, mitigate, or overcome the difficulties encountered when performing ALD and plasma-enhanced ALD on porous polymers. We intend this article to serve as a “lessons learned” guide informed by previous experience to provide a better understanding of the difficulties and limitations of ALD on porous polymers and knowledge-based guidelines for successful depositions. This knowledge can accelerate future research and help experimentalists navigate and troubleshoot as they expose porous polymers to reactive precursor vapors.

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Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: Horizon 2020 Framework Programme; Israel Ministry of Energy and Water; Israel-United States Binational Industrial Research and Development Foundation (BIRD); USDOE; USDOE Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 2561418

Alternate ID(s):: OSTI ID: 2573943

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Journal Issue: 2 Vol. 43; ISSN 1520-8559; ISSN 0734-2101

Publisher:: American Vacuum Society / AIPCopyright Statement

Country of Publication:: United States

Language:: English

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