Modeling and simulation for the semiconductor and optoelectronic industries

Technical Report · Sat Jun 01 00:00:00 EDT 1996

DOI:https://doi.org/10.2172/254941· OSTI ID:254941

Cartwright, D; Albers, R; George, D ^[1]

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1. Los Alamos National Lab., NM (United States); and others

This is the final report of a two-year, Laboratory-Directed Research and Development (LDRD) project at the Los Alamos National Laboratory (LANL). Semiconductor technology development costs and time-to-market pressures are rapidly increasing with each new technology generation. However, computer-aided integrated circuit (IC) design tools have been shown to reduce IC design time and overall costs, and the micro- and opto-electronics industries have come to believe that enlarging the modeling scope to include new materials processing simulators will have a corresponding profound impact on manufacturing. This project sought to assess the feasibility of building a suite of predictive advanced technology modeling and simulation tools for use by the semiconductor industry.

• Research Organization: Los Alamos National Lab., NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 254941
• Report Number(s): LA-UR--96-1771; ON: DE96011236
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
99 GENERAL AND MISCELLANEOUS
BENCHMARKS
COMPUTER CODES
COMPUTERIZED SIMULATION
CRYSTAL DOPING
DESIGN
INTEGRATED CIRCUITS
ION IMPLANTATION
MANUFACTURING
MESH GENERATION
MICROELECTRONIC CIRCUITS
MICROELECTRONICS
PROCESS CONTROL
SEMICONDUCTOR DEVICES
THERMOCHEMICAL PROCESSES