Characterization of SAL605 negative resist at {lambda}=13 nm

Conference · Fri May 24 00:00:00 EDT 1996

OSTI ID:251202

La Fontaine, B; Ciarlo, D; Gaines, D P; Kania, D R

We have characterized the response of the negative resist SAL605 in the extreme ultraviolet ({lambda}=13 nm). The sensitivity was found to be {approx}1 mJ/cm{sup 3} for all conditions studied. We have identified processing conditions leading to high ({gamma}{gt}4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.

• Research Organization: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 251202
• Report Number(s): UCRL-JC-123012; CONF-960493-14; ON: DE96012224
• Resource Relation: Conference: Optical Society of America (OSA) meeting on integrated photonics research, Boston, MA (United States), 29 Apr - 3 May 1996; Other Information: PBD: 24 May 1996
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
36 MATERIALS SCIENCE
MICROELECTRONIC CIRCUITS
SCREEN PRINTING
FABRICATION
PRINTED CIRCUITS
POLYMERS
PHOTOCHEMISTRY
PROCESSING
EXTREME ULTRAVIOLET RADIATION
LASER-PRODUCED PLASMA
TUNGSTEN
RADIATION DOSES
PHYSICAL RADIATION EFFECTS