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Nitrogen: A promising doping strategy for high-performance ovonic threshold switching selectors

Journal Article · · Journal of Alloys and Compounds
 [1];  [1];  [1];  [1];  [1];  [2];  [3];  [4];  [5];  [1];  [1]
  1. Huazhong University of Science and Technology, Wuhan (China); Hubei Yangtze Memory Laboratories, Wuhan (China)
  2. University of Hong Kong (China)
  3. Nanyang Institute of Technology (China)
  4. Ames Laboratory, and Iowa State University, Ames, IA (United States)
  5. Fudan University, Shanghai (China)
The Ovonic Threshold Switching (OTS) selector serves as an essential component in the development of three-dimensional high-density memory integration technology. Nevertheless, the state-of-the-art high-performance OTS materials usually contain toxic elements such as arsenic (As), posing significant risks to both environmental and human health. Nitrogen (N), which belongs to the same group as arsenic (As), has emerged as a highly promising alternative for As doping. However, the underlying mechanisms that govern N-based OTS materials have not yet been extensively investigated. In this study, we delve into the effects of N doping on the structural, bonding, and electronic properties of amorphous GeSe (a-GeNSe) by ab initio molecular dynamics simulations to bridge the knowledge gap. Our findings indicate that upon N doping in a-GeSe, the formation of robust Ge-N bonds, along with N-centered tetrahedral and triangular structures, resulting in the sluggish atomic movement that enhances the thermal stability and endurance of a-GeNSe. The OTS characteristics are significantly influenced by the material’s electronic band structure, and thus the relatively slow performance drift can be attributed to the stabilization of mid-gap states, a result of N doping which effectively slows down the aging process of chalcogenide glass. Moreover, the increased mobility gap in a-GeNSe raises the threshold voltage (Vth), making it more compatible with commercially available phase-change memory materials. Furthermore, our findings reveal the extensive impact of the N element on a typical OTS material and offer valuable perspectives for alternative doping strategies that could potentially supplant As practices.
Research Organization:
Ames Laboratory (AMES), Ames, IA (United States)
Sponsoring Organization:
National Science and Technology Major Project of China; USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)
Grant/Contract Number:
AC02-07CH11358
OSTI ID:
2481302
Report Number(s):
AL-J--150
Journal Information:
Journal of Alloys and Compounds, Journal Name: Journal of Alloys and Compounds Vol. 1005; ISSN 0925-8388
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English

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