Origins of quench in buffered chemical polished and low temperature baked SRF cavities
- Chicago U.
- Fermilab
Electropolishing (EP) and buffered chemical polishing (BCP) are conventional surface preparation techniques for superconducting radiofrequency (SRF) cavities that remove damaged material from the cavity surface. One main issue with EP and BCP treated SRF cavities is high field Q-slope (HFQS), a drop in quality factor at high gradients that limits quench field. High gradient performance in EP cavities can be improved by applying a low temperature bake (LTB), but LTB does not consistently remove HFQS in BCP cavities. There is no consensus as to the why LTB is not effective on BCP prepared cavities, and the cause of HFQS in BCP cavities is not well understood. We examine the origins of quench in EP, BCP, EP+LTB, and BCP+LTB treated SRF cavities. We also show the effect of these treatments on the onset of HFQS, heating within the cavity up to quench, concentration of free hydrogen, and surface roughness.
- Research Organization:
- Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), High Energy Physics (HEP) (SC-25)
- DOE Contract Number:
- AC02-07CH11359
- OSTI ID:
- 2479598
- Report Number(s):
- FERMILAB-CONF-23-0905-SQMS; oai:inspirehep.net:2717538
- Conference Information:
- Journal Name: JACoW Journal Volume: IPAC2023
- Country of Publication:
- United States
- Language:
- English
Similar Records
Comparing the Effectiveness of Low Temperature Bake in EP and BCP Cavities
Update on the R&D of vertical buffered electropolishing on Nb samples and SRF single cell cavities
Buffered Electrochemical Polishing of Niobium
Conference
·
Mon Sep 25 00:00:00 EDT 2023
· JACoW
·
OSTI ID:2279063
Update on the R&D of vertical buffered electropolishing on Nb samples and SRF single cell cavities
Conference
·
Fri Jun 01 00:00:00 EDT 2012
·
OSTI ID:1994845
Buffered Electrochemical Polishing of Niobium
Journal Article
·
Mon Feb 28 23:00:00 EST 2011
· Journal of Applied Electrochemistry
·
OSTI ID:1032483