Annealing temperature variation and its influence on the self-cleaning properties of TiO2 thin films
- University of Johannesburg (South Africa)
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Titanium dioxide (TiO2) is an important material in science and engineering because of its basic and synthetic properties. Nevertheless, there is a dearth of reports in the open literature focusing on its ability to self-clean under temperature changes. In this study, we used the spin coating technique to produce TiO2 thin films to evaluate its self-cleaning ability after annealing at different temperatures. The TiO2 sol was obtained through an endothermal sol-gel process, and the gel was coated on a glass substrate using a spin coater. The deposited films were then annealed at 400 °C, 600 °C, and 800 °C for 1 h. The influence of annealing temperature variation on the self-cleaning properties of the thin film was characterized using X-ray diffraction, scanning electron microscope; Fourier transformed infrared spectrometric analysis and UV-vis spectrophotometer. A test to ascertain self-cleaning was conducted using the degradation of methylene blue, and the different films were tested for durability. The durability test confirmed the connection between solid coating and substrate at all annealing temperatures. Thin films annealed at 600 °C revealed the best self-cleaning properties. The morphological analysis revealed snowflake shapes uniformly distributed over the substrate at 400 °C, and agglomeration improved as the annealing temperature increased. Structural analysis showed an increase in crystallinity with an increase in annealing temperature for both rutile and anatase phases. At three different temperatures, the chemical bond and the absorption band pattern followed the same path, although the peak intensity declined with temperature rise. Finally, the optical bandgap of the thin coated TiO2 declined from 3.39 eV to 3.20 eV as the binding temperature increased from 400 to 800 °C.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC02-05CH11231
- OSTI ID:
- 2470573
- Journal Information:
- Heliyon, Journal Name: Heliyon Journal Issue: 5 Vol. 8; ISSN 2405-8440
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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