Simulation images from a low-pressure chlorine plasma reactor using DSMC

Journal Article · Wed Jan 31 23:00:00 EST 1996 · IEEE Transactions on Plasma Science

DOI:https://doi.org/10.1109/27.491745· OSTI ID:244948

Johannes, J; Bartel, T J ^[1]; Economou, D J; Lymberopoulos, D P; Wise, R S ^[2]

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1. Sandia National Labs., Albuquerque, NM (United States)
2. Univ. of Houston, TX (United States)

Modeling of high-density chemically reacting plasmas at low pressures (<10 mtorr) is of interest to the microelectronics industry for improving tool and process designs. High-density plasma simulations were performed using a fluids code to predict electron behavior, coupled to a Direct Simulation Monte Carlo (DSMC) program for neutral and ion transport. Images presented are for a chlorine plasma simulation at 10 mtorr and include the temperature difference between neutral species, depicting the nonthermal equilibrium nature of the plasma, and angular and energy distributions of ions and neutrals to the wafer surface.

• OSTI ID: 244948
• Journal Information: IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 1 Vol. 24; ISSN ITPSBD; ISSN 0093-3813
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
36 MATERIALS SCIENCE
42 ENGINEERING
CHEMICAL REACTORS
ENERGY SPECTRA
ETCHING
FABRICATION
MICROELECTRONIC CIRCUITS
PLASMA SIMULATION
SILICON
SPATIAL DISTRIBUTION
THEORETICAL DATA