Heterogeneous Morphologies and Hardness of Co-Sputtered Thin Films of Concentrated Cu-Mo-W Alloys

Wissuchek, Forrest; Derby, Benjamin K.; Misra, Amit

doi:10.3390/nano14181513

Heterogeneous Morphologies and Hardness of Co-Sputtered Thin Films of Concentrated Cu-Mo-W Alloys

Journal Article · Wed Sep 18 00:00:00 EDT 2024 · Nanomaterials

DOI:https://doi.org/10.3390/nano14181513· OSTI ID:2447575

^[1]; ^[2]; Misra, Amit ^[1]

Department of Material Science and Engineering, University of Michigan, Ann Arbor, MI 48109, USA
Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, NM 87545, USA

Heterogeneous microstructures in Cu-Mo-W alloy thin films formed by magnetron co-sputtering immiscible elements with concentrated compositions are characterized using scanning transmission electron microscopy (STEM) and nanoindentation. In this work, we modified the phase separated structure of a Cu-Mo immiscible system by adding W, which impedes surface diffusion during film growth. The heterogeneous microstructures in the Cu-Mo-W ternary system exhibited bicontinuous matrices and agglomerates composed of Mo(W)-rich phase. This is unique, as these are the slower-diffusing species, contrasting past reports of binary Cu-Mo thin films that exhibited Cu-rich agglomerates. The bicontinuous matrices comprised of Cu-rich and Mo(W)-rich phases exhibited bilayer thicknesses of less than 5 nm. The hardness of these thin films measured using nanoindentation is reported and compared to similar multilayers and nanocomposites in binary systems.

View Accepted Manuscript (DOE)

Research Organization:: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States); Texas A & M University, College Station, TX (United States)

Sponsoring Organization:: USDOE; USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: 89233218CNA000001; NA0003857

OSTI ID:: 2447575

Alternate ID(s):: OSTI ID: 2447951

Report Number(s):: LA-UR--24-28896

Journal Information:: Nanomaterials, Journal Name: Nanomaterials Journal Issue: 18 Vol. 14; ISSN 2079-4991

Publisher:: MDPICopyright Statement

Country of Publication:: United States

Language:: English

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