Direct Exfoliation of Nanoribbons from Bulk van der Waals Crystals

Saunders, Ashley P.; Chen, Victoria; Wang, Jierong; Li, Qitong; Johnson, Amalya C.; McKeown‐Green, Amy S.; Zeng, Helen J.; Mac, T. Kien; Trinh, M. Tuan; Heinz, Tony F.; Pop, Eric; Liu, Fang

doi:10.1002/smll.202403504

Direct Exfoliation of Nanoribbons from Bulk van der Waals Crystals

Journal Article · Wed Aug 14 00:00:00 EDT 2024 · Small

DOI:https://doi.org/10.1002/smll.202403504· OSTI ID:2447042

Saunders, Ashley P. ^[1]; Chen, Victoria ^[2]; Wang, Jierong ^[3]; Li, Qitong ^[3]; Johnson, Amalya C. ^[2]; McKeown‐Green, Amy S. ^[2]; Zeng, Helen J. ^[2]; Mac, T. Kien ^[4]; Trinh, M. Tuan ^[4]; ^[3]; ^[3]; ^[2]

Stanford Univ., CA (United States); SLAC
Stanford Univ., CA (United States)
Stanford Univ., CA (United States); SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
Utah State Univ., Logan, UT (United States)

Confinement of monolayers into quasi-1D atomically thin nanoribbons could lead to novel quantum phenomena beyond those achieved in their bulk and monolayer counterparts. However, current experimental availability of nanoribbon species beyond graphene is limited to bottom-up synthesis or lithographic patterning. Here, in this study, a versatile and direct approach is introduced to exfoliate bulk van der Waals crystals as nanoribbons. Akin to the Scotch tape exfoliation method for producing monolayers, this technique provides convenient access to a wide range of nanoribbons derived from their corresponding bulk crystals, including MoS₂, WS₂, MoSe₂, WSe₂, MoTe₂, WTe₂, ReS₂, and hBN. The nanoribbons are predominantly monolayer, single-crystalline, parallel-aligned, flat, and exhibit high aspect ratios. The role of confinement, strain, and edge configuration of these nanoribbons is observed in their electrical, magnetic, and optical properties. This versatile exfoliation technique provides a universal route for producing a variety of nanoribbon materials and supports the study of their fundamental properties and potential applications.

View Accepted Manuscript (DOE)

Research Organization:: SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)

Grant/Contract Number:: AC02-76SF00515

OSTI ID:: 2447042

Journal Information:: Small, Journal Name: Small Journal Issue: 47 Vol. 20; ISSN 1613-6810

Publisher:: WileyCopyright Statement

Country of Publication:: United States

Language:: English

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