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Electrophoretic deposition of Y{sub 2}O{sub 3}-stabilized ZrO{sub 2} on the porous La{sub 0.8}Sr{sub 0.2}MnO{sub 3} cathode substrate for SOFC

Book ·
OSTI ID:242487
; ;  [1];  [2]
  1. Oita Univ. (Japan)
  2. NKK Corp., Kawasaki, Kanagawa (Japan). Engineering Research Center

Preparation of YSZ film on La{sub 0.8}Sr{sub 0.2}MnO{sub 3} porous substrate was investigated using electrophoretic deposition (EPD) method. Since the electrical conductivity of La{sub 0.8}Sr{sub 0.2}MnO{sub 3} substrate is satisfactorily high at room temperature, YSZ powders were deposited electrophoretically on La{sub 0.8}Sr{sub 0.2}MnO{sub 3} substrate without any treatment such as metal coating. Open circuit voltage of SOFC where YSZ film prepared by EPD was applied, increased by repeating the deposition and calcination cycles. 6 or more times in repetitions were required to obtain YSZ film without gas leakage. A planar type SOFC fabricated by using Ni as anode, attained an open circuit voltage and maximum power density of 1.0 V and 1.5 W/cm{sup 2}, respectively. It became evident that YSZ films without gas leakage can be prepared by the EPD method on LaMnO{sub 3} cathode substrates.

OSTI ID:
242487
Report Number(s):
CONF-950683--; ISBN 1-56677-095-5
Country of Publication:
United States
Language:
English