Influence of defects on the femtosecond laser damage resistance of multilayer dielectric gratings

Zhang, Simin; Su, Ziyao; Menoni, Carmen S.; Chowdhury, Enam A.

doi:10.1364/ol.483581

Influence of defects on the femtosecond laser damage resistance of multilayer dielectric gratings

Journal Article · Sat Dec 31 23:00:00 EST 2022 · Optics Letters

DOI:https://doi.org/10.1364/ol.483581· OSTI ID:2421385

^[1]; Su, Ziyao; ; Chowdhury, Enam A.

OSTI

Multilayer dielectric (MLD) gratings with high diffraction efficiency and a high laser-induced damage (LID) threshold for pulse compressors are key to scaling the peak and average power of chirped pulse amplification lasers. However, surface defects introduced by manufacturing, storage, and handling processes can reduce the LID resistance of MLD gratings and impact the laser output. The underlying mechanisms of such defect-initiated LID remain unclear, especially in the femtosecond regime. In this Letter, we model dynamic processes in interactions of a 20-fs near-infrared (NIR) laser pulse and a MLD grating design in the presence of cylindrically symmetrical nodules and particle contaminants and cracks at the surface. Utilizing a dynamic model based on a 2D finite difference in time domain (FDTD) field solver coupled with photoionization, electron collision, and refractive index modification, we study the simulation results for the damage site distribution initiated by defects of various types and sizes and its impact on the LID threshold of the grating design.

Research Organization:: XUV Lasers, Inc., Fort Collins, CO (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

DOE Contract Number:: SC0019900

OSTI ID:: 2421385

Journal Information:: Optics Letters, Journal Name: Optics Letters Journal Issue: 5 Vol. 48; ISSN 0146-9592; ISSN OPLEDP

Publisher:: Optical Society of America (OSA)

Country of Publication:: United States

Language:: English

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