Photoluminescence probing of light absorption centers at silica laser damage

Rho, Yoonsoo; Daeumer, Matthias A.; Miller, Christopher F.; Mah, Christopher M.; Laurence, Ted A.; Carr, Christopher W.; Yoo, Jae Hyuck

doi:10.1364/OE.527241

Photoluminescence probing of light absorption centers at silica laser damage

Journal Article · Tue Jul 09 00:00:00 EDT 2024 · Optics Express

DOI:https://doi.org/10.1364/OE.527241· OSTI ID:2396779

Rho, Yoonsoo; Daeumer, Matthias A.; Miller, Christopher F.; Mah, Christopher M.; Laurence, Ted A.; Carr, Christopher W.;

We use photoluminescence (PL) imaging to study damage growth precursors within laser damage sites on the surface of silica. Damage site evolution is induced by multiple shots of UV nanosecond pulsed laser at various energy densities and monitored throughout the early stages of growth. Wide-field PL imaging rapidly locates microscopic light absorption centers within the silica damage site. Our quantitative analysis shows that damage sites with strong local PL intensity show a higher probability of growth upon subsequent laser pulses. Scanning electron microscopy (SEM) paired with a study of PL spectrum shows that the strong PL intensity appears from the subsurface fractures with high defect density, which provides a local light absorption center leading to significant damage growth. We believe that this result offers an efficient optical damage mitigation strategy by providing a rapid and non-destructive optical inspection approach.

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Sponsoring Organization:: USDOE

OSTI ID:: 2396779

Alternate ID(s):: OSTI ID: 2532503

Journal Information:: Optics Express, Journal Name: Optics Express Journal Issue: 15 Vol. 32; ISSN 1094-4087; ISSN OPEXFF

Publisher:: Optical Society of AmericaCopyright Statement

Country of Publication:: United States

Language:: English

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