Infrared nanospectroscopy characterization of metal oxide photoresists

Zhao, Xiao; Wu, Cheng (Will); Bechtel, Hans A.; Weidman, Timothy; Salmeron, Miquel B.

doi:10.1117/1.jmm.21.4.041408

Infrared nanospectroscopy characterization of metal oxide photoresists

Journal Article · Mon Dec 05 23:00:00 EST 2022 · Journal of Micro/Nanopatterning, Materials, and Metrology

DOI:https://doi.org/10.1117/1.jmm.21.4.041408· OSTI ID:2329276

Zhao, Xiao ^[1]; Wu, Cheng (Will) ^[2]; Bechtel, Hans A. ^[3]; Weidman, Timothy ^[2]; Salmeron, Miquel B. ^[1]

Univ. of California, Berkeley, CA (United States); Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Lam Research Corporation, Fremont, CA (United States)
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)

Implementation of extreme ultraviolet (EUV) lithography in high-volume semiconductor manufacturing requires a reliable and scalable EUV resist platform. A mechanistic understanding of the pros and cons of different EUV resist materials is critically important. However, most material characterization methods with nanometer resolution use an x-ray photon or electron beam as the probe, which often cause damage to the photoresist film during measurement. Here, we illustrated the use of non-destructive infrared nanospectroscopy [or nano-Fourier-Transform infrared spectroscopy (nano-FTIR)] to obtain spatially resolved composition information in patterned photoresist films. Further, clear evidence of exposure-induced chemical modification was observed at a spatial resolution down to 40 nm, well below the diffraction limit of infrared light. With improvements, such a nano-FTIR technique with nanoscale spatial resolution, chemical sensitivity, and minimal radiation damage can be a promising candidate for the fundamental study of material properties relevant to EUV lithography.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS); Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Molecular Foundry

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE); National Science Foundation (NSF)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 2329276

Journal Information:: Journal of Micro/Nanopatterning, Materials, and Metrology, Journal Name: Journal of Micro/Nanopatterning, Materials, and Metrology Journal Issue: 04 Vol. 21; ISSN 2708-8340

Publisher:: SPIECopyright Statement

Country of Publication:: United States

Language:: English

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