Effect of surface roughness on the acid etching of amorphous silica
Journal Article
·
· Journal of the American Ceramic Society
- Vanderbilt Univ., Nashville, TN (United States). Dept. of Physics and Astronomy
The effect of the root-mean-square (rms) roughness on the acid etching of roughened amorphous silica was studied as a function of time using atomic force microscopy and laser light scattering. The initial size and distribution of micrometer-sized surface flaws are shown to influence the time evolution of the etching by hydrofluoric acid. The increase in the optical transparency of the samples is linked to the large increases in the correlation lengths of the sample surfaces, an effect which counteracts the accompanying rise in the rms roughness.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 230742
- Journal Information:
- Journal of the American Ceramic Society, Journal Name: Journal of the American Ceramic Society Journal Issue: 3 Vol. 79; ISSN 0002-7820; ISSN JACTAW
- Country of Publication:
- United States
- Language:
- English
Similar Records
Two modes of surface roughening during plasma etching of silicon: Role of ionized etch products
Adsorption of silica colloids onto like-charged silica surfaces of different roughness
Effects of micrometer-scale surface roughness on thermal infrared emittance spectra of silica glass
Journal Article
·
Sat Dec 13 23:00:00 EST 2014
· Journal of Applied Physics
·
OSTI ID:22402759
Adsorption of silica colloids onto like-charged silica surfaces of different roughness
Journal Article
·
Mon Jan 16 19:00:00 EST 2017
· Colloids and Surfaces. A, Physicochemical and Engineering Aspects
·
OSTI ID:1348992
Effects of micrometer-scale surface roughness on thermal infrared emittance spectra of silica glass
Journal Article
·
Sat Oct 31 20:00:00 EDT 2020
· Icarus
·
OSTI ID:1639914