EXELFS studies of CN{sub x} thin films
Conference
·
OSTI ID:230175
- Univ. of Stockholm (Sweden)
- Univ. of Linkoeping (Sweden); and others
Electron energy loss spectroscopy is used to analyse the structure of a CN{sub x} thin film deposited on a Si (001) substrate, held at 500{degrees}C, by reactive magnetron sputtering. The elemental composition is determined to {approximately}20 at% nitrogen. From the near edge spectra of the carbon K edge a sp{sup 2} contents of {approximately}53 % could be estimated. In the Extended Energy Loss Fine Structure analysis an unusually broad and intense peak was found in the RDF at {approximately}8.8 {Angstrom}. This peak is regarded as evidence of some large scale spherical structures also seen in the High Resolution Electron Microscopy micrographs.
- OSTI ID:
- 230175
- Report Number(s):
- CONF-950840-; TRN: 96:000433-0177
- Resource Relation:
- Conference: International conference on applications of diamond films and related materials, Gaithersburg, MD (United States), 21-24 Aug 1995; Other Information: PBD: 1995; Related Information: Is Part Of Applications of diamond films and related materials: Third international conference; Feldman, A.; Yarbrough, W.A.; Murakawa, Masao; Tzeng, Yonhua; Yoshikawa, Masanori [eds.]; PB: 973 p.
- Country of Publication:
- United States
- Language:
- English
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