Nanocrystalline diamond membrane growth by cyclic renucleation

Conference · Sun Dec 31 04:00:00 EST 1995

OSTI ID:230030

Troilo, L M ^[1]; Owens, M S ^[2]

---

1. Geo-Centers, Inc., Fort Washington, MD (United States)
2. Naval Research Lab., Washington, DC (United States); and others

Smooth, clear nanocrystalline diamond films have been grown on Si substrates to a thickness between 0.7 and 3.0 microns, and were subsequently etched into membrane structures for use as proximity mask membranes in x-ray lithography, x-ray window, and optical pellicle beamsplitter applications. The diamond deposition was by microwave plasma enhanced, chemical vapor deposition using a cyclic renucleation process. The gas mixtures of hydrogen, methane, nitrogen and oxygen were cyclically altered to control grain size and quality. Nanocrystalline grain sizes were achieved without significant introduction of amorphous carbon into the material as determined by micro-Raman analysis.

• OSTI ID: 230030
• Report Number(s): CONF-950840--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL VAPOR DEPOSITION
DIAMONDS
FILMS
GRAIN GROWTH
GRAIN SIZE
MEMBRANES
OPTICAL PROPERTIES
TENSILE PROPERTIES
THICKNESS