Role of Local Conductivities in the Plasmon Reflections at the Edges and Stacking Domain Boundaries of Trilayer Graphene

Choi, Boogeon; Jeong, Gyouil; Ahn, Seongjin; Lee, Hankyul; Jang, Yunsu; Park, Baekwon; Bechtel, Hans A.; Hong, Byung Hee; Min, Hongki; Kim, Zee Hwan

doi:10.1021/acs.jpclett.3c01593

Role of Local Conductivities in the Plasmon Reflections at the Edges and Stacking Domain Boundaries of Trilayer Graphene

Journal Article · Tue Sep 05 00:00:00 EDT 2023 · Journal of Physical Chemistry Letters

DOI:https://doi.org/10.1021/acs.jpclett.3c01593· OSTI ID:2294048

^[1]; Jeong, Gyouil ^[1]; Ahn, Seongjin ^[2]; ^[1]; Jang, Yunsu ^[1]; Park, Baekwon ^[1]; Bechtel, Hans A. ^[3]; ^[1]; ^[1]; ^[1]

Seoul National Univ. (Korea, Republic of)
Chungbuk National Univ., Cheongju (Korea, Republic of)
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Here, we employed infrared scattering-type scanning near-field optical microscopy (IR-sSNOM) to study surface plasmon polaritons (SPPs) in trilayer graphene (TLG). Our study reveals systematic differences in near-field IR spectra and SPP wavelengths between Bernal (ABA) and rhombohedral (ABC) TLG domains on SiO₂, which can be explained by stacking-dependent intraband conductivities. We also observed that the SPP reflection profiles at ABA-ABC boundaries could be mostly accounted for by an idealized domain boundary defined by the conductivity discontinuity. However, we identified distinct shapes in the SPP profiles at the edges of the ABA and ABC TLG, which cannot be solely attributed to idealized edges with stacking-dependent conductivities. Instead, this can be explained by the presence of various edge structures with local conductivities differing from those of bulk TLGs. Our findings unveil a new structural element that can control SPP and provide insights into the structures and electronic states of the edges of few-layer graphene.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: National Research Foundation of Korea (NRF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences & Biosciences Division (CSGB); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 2294048

Journal Information:: Journal of Physical Chemistry Letters, Journal Name: Journal of Physical Chemistry Letters Journal Issue: 36 Vol. 14; ISSN 1948-7185

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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