Organosilane-assisted selective etching strategy for fabrication of hollow/rattle-type mesoporous organosilica nanospheres
- School of Chemistry, Chemical Engineer and Life Science, Wuhan University of Technology, Wuhan 430070 (China)
- School of food and environmental engineering, Wuchang Institute of Technology, Wuhan 430065 (China)
- School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070 (China)
Highlights: • Effective fabrication of organic hollow/rattle-type mesoporous organosilica. • The addition of CTES could increase the porosity of the materials. • Pore-making agent (CTES) could be removed by alkali treatment without additional step. - Abstract: A facile strategy to fabricate hollow or rattle-type mesoporous silica nanospheres (HMSNs or RMSNs) with organic functional groups and porous shell was developed. Herein, thiol-HMSNs were obtained via treating vinyl-SiO{sub 1.5} @cyano&thiol-SiO{sub 1.5} prepared by using 3-mercaptopropyltrimethoxysilane (MPTMS) as organosilane precursor, vinyltriethoxysilane (VTES) as sacrificial template precursor and cyanoethyltriethoxysilane (CTES) as pore-making agent. In this method, CTES was co-condensed with MPTMS to form hybrid shell and played an important role in the formation of pore structures. When the volume ratio of MPTMS to CTES was 1:1, well-defined thiol-HMSNs with a specific surface area of 295.6 m{sup 2} g{sup −1} and pore volume of 0.51 cm{sup 3} g{sup −1} could be obtained. Moreover, [email protected] could also be synthesized through this method from three-layered structures (thiocyanato-SiO{sub 1.5} @vinyl-SiO{sub 1.5} @cyano&thiol-SiO{sub 1.5}). The as-prepared RMSNs presented good performance for the adsorption of 2, 4-dichloropheno in water. And this selective etching strategy was versatile and might be extended to fabricate more valuable organic hollow/rattle-type composites for different applications.
- OSTI ID:
- 22890249
- Journal Information:
- Journal of Solid State Chemistry (Print), Vol. 266; Other Information: © 2018 Elsevier Inc. All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0022-4596
- Country of Publication:
- Netherlands
- Language:
- English
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