Studying the Surface Conductivity of a Thallium Bilayer on Si(111) Substrate after Adsorption of Lithium and Rubidium
Journal Article
·
· Technical Physics Letters
- Russian Academy of Sciences, Institute of Automation and Control Processes, Far East Branch (Russian Federation)
Changes in the state of a thallium bilayer on Si(111) substrate, Si(111)6 × 6–Tl, after adsorption of lithium and rubidium were studied using low-energy electron-diffraction and four-point probe-conductivity measurements. New surface reconstructions 5 × 1 and 5√3×5√3 were observed after the adsorption of lithium, and 2 × 2 and √3×√3 reconstructions appeared after the adsorption of rubidium. The surface conductivity of silicon substrates was studied as a function of the dose of deposited adsorbate. It is established that the formation of both 5 × 1 and 2 × 2 reconstructions retains the conducting properties of a two-dimensional channel constituted by the thallium bilayer.
- OSTI ID:
- 22786469
- Journal Information:
- Technical Physics Letters, Journal Name: Technical Physics Letters Journal Issue: 5 Vol. 44; ISSN 1063-7850
- Country of Publication:
- United States
- Language:
- English
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