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Field-effect transistors with high mobility and small hysteresis of transfer characteristics based on CH{sub 3}NH{sub 3}PbBr{sub 3} films

Journal Article · · Physics of the Solid State
; ;  [1]
  1. Russian Academy of Sciences, Ioffe Institute (Russian Federation)
Field-effect transistor (FET) structures based on soluble organometallic perovskites, CH{sub 3}NH{sub 3}PbBr{sub 3}, were obtained and their electrical properties were studied. FETs made of CH{sub 3}NH{sub 3}PbBr{sub 3} films possess current- voltage characteristics (IVs) typical for ambipolar FETs with saturation regime. The transfer characteristics of FETs based on CH{sub 3}NH{sub 3}PbBr{sub 3} have an insignificant hysteresis and slightly depend on voltage at the source-drain. Mobilities of charge carriers (holes) calculated from IVs of FETs based on CH{sub 3}NH{sub 3}PbBr{sub 3} at 300 K in saturation and weak field regimes were ~5 and ~2 cm{sup 2}/V s, respectively, whereas electron mobility is ~3 cm{sup 2}/V s, which exceeds the mobility value ~1 cm{sup 2}/V s obtained earlier for FETs based on CH{sub 3}NH{sub 3}PbI{sub 3}.
OSTI ID:
22771655
Journal Information:
Physics of the Solid State, Journal Name: Physics of the Solid State Journal Issue: 12 Vol. 59; ISSN 1063-7834
Country of Publication:
United States
Language:
English