Effect of an External Magnetic Field on the Absorption Efficiency of the RF Power in a Spatially Bounded Inductive Plasma Source

Journal Article · Sat Sep 15 04:00:00 EDT 2018 · Plasma Physics Reports

DOI:https://doi.org/10.1134/S1063780X18090088· OSTI ID:22763224

Vavilin, K. V.; Zadiriyev, I. I.; Nikonov, A. M. ^[1]

---

1. Moscow State University, Department of Physics (Russian Federation)

The measured dependences of the equivalent plasma resistance on the external magnetic field (0–50 G) in a 46-cm-diameter RF inductive plasma source operating at frequencies of 2, 4, and 13.56 MHz and a power of 100–500 W are presented. The experiments were carried out in argon at pressures of 0.1–30 mTorr. The presence of the external magnetic field leads to the appearance of resonance domains of efficient RF power absorption corresponding to the conditions of resonance excitation of helicons coupled with Trivelpiece–Gould modes. It is shown that RF power absorption at frequencies of 2 MHz can be optimized by applying an external magnetic field corresponding to the domains of resonance absorption. The effect is enhanced with increasing operating frequency.

• OSTI ID: 22763224
• Journal Information: Plasma Physics Reports, Journal Name: Plasma Physics Reports Journal Issue: 9 Vol. 44; ISSN PPHREM; ISSN 1063-780X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON
EFFICIENCY
EXCITATION
MAGNETIC FIELDS
MHZ RANGE 01-100
PLASMA
RESONANCE
RESONANCE ABSORPTION