Langmuir probe study of an inductively coupled magnetic-pole-enhanced helium plasma

Journal Article · Mon May 15 04:00:00 EDT 2017 · Plasma Physics Reports

DOI:https://doi.org/10.1134/S1063780X17050105· OSTI ID:22760333

Younus, Maria ^[1]; Shafiq, M.; Naeem, M. ^[1]; Zaka-ul-Islam, M. ^[2]; Zakaullah, M. ^[1]

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1. Quaid-i-Azam University, Department of Physics (Pakistan)
2. Jazan University, Department of Physics, Faculty of Science (Saudi Arabia)

This study reports the effects of RF power and filling gas pressure variation on the plasma parameters, including the electron number density n{sub e}, electron temperature T{sub e}, plasma potential V{sub p}, skin depth δ, and electron energy probability functions (EEPFs) in a low-pressure inductively coupled helium plasma source with magnetic pole enhancement. An RF compensated Langmuir probe is used to measure these plasma parameters. It is observed that the electron number density increases with both the RF power and the filling gas pressure. Conversely, the electron temperature decreases with increasing RF power and gas pressure. It is also noted that, at low RF powers and gas pressures, the EEPFs are non-Maxwellian, while at RF powers of ≥50 W, they evolve into a Maxwellian distribution. The dependences of the skin depth and plasma potential on the RF power are also studied and show a decreasing trend.

• OSTI ID: 22760333
• Journal Information: Plasma Physics Reports, Journal Name: Plasma Physics Reports Journal Issue: 5 Vol. 43; ISSN PPHREM; ISSN 1063-780X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ELECTRON TEMPERATURE
HELIUM
LANGMUIR PROBE
PLASMA
PLASMA POTENTIAL