Catalyst-free growth of ZnO nanowires on ITO seed/glass by thermal evaporation method: Effects of ITO seed layer thickness

Journal Article · Tue Jul 19 00:00:00 EDT 2016 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4958785· OSTI ID:22608480

Ahmed, Naser M. ^[1]; Hassan, Z. ^[2]

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1. School of Physics, Universiti Sains Malaysia, 11800 USM, Penang (Malaysia)
2. Institute of Nano-Optoelectronics Research and Technology Laboratory (INOR), Universiti Sains Malaysia, 11800 USM, Penang (Malaysia)

A seed/catalyst-free growth of ZnO nanowires (ZnO-NWs) on a glass substrate were successfully fabricated using thermal evaporation technique. These nanowires were grown on ITO seed layers of different thicknesses of 25 and 75 nm, which were deposited on glass substrates by radio frequency (RF) magnetron sputtering. Prior to synthesized ITO nanowires, the sputtered ITO seeds were annealed using the continuous wave (CW) CO2 laser at 450 °C in air for 15 min. The effect of seed layer thickness on the morphological, structural, and optical properties of ZnO-NWs were systematically investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and UV-Vis spectrophotometer.

• OSTI ID: 22608480
• Journal Information: AIP Conference Proceedings, Vol. 1756, Issue 1; Conference: ICoFM 2016: 2. international conference on functional materials and metallurgy, Penang (Malaysia), 28 May 2016; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
CARBON DIOXIDE
CATALYSTS
FIELD EMISSION
GLASS
INDIUM OXIDES
LAYERS
MAGNETRONS
NANOWIRES
OPTICAL PROPERTIES
RADIOWAVE RADIATION
SCANNING ELECTRON MICROSCOPY
SPECTROPHOTOMETERS
SPUTTERING
SUBSTRATES
THICKNESS
TIN OXIDES
X RADIATION
X-RAY DIFFRACTION
ZINC OXIDES