Effects of Ti doping on the dielectric properties of HfO{sub 2} nanoparticles
We report the effects of Ti doping on the dielectric properties of HfO{sub 2} [Hf{sub 1-x}Ti{sub x}O{sub 2} (x = 0.2-0.8)] nanoparticles at room temperature. The Hf{sub 1-x}Ti{sub x}O{sub 2} nanoparticles were synthesized by a wet chemical process. The structural and morphological properties of the derived samples were analyzed with X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and high resolution transmission electron microscopy (HRTEM). Impedance analysis was performed in pelletized samples in the frequency range of 1 MHz to 1 GHz. The obtained results were analyzed in correlation with microstructure and doping concentration in the derived samples. The average size of the Hf{sub 1-x}Ti{sub x}O{sub 2} nanoparticles is typically in the range of 4-8 nm depending on the processing temperature. The Hf{sub 1−x}Ti{sub x}O{sub 2} nanoparticles show reduction in crystallinity with the increase in Ti doping. The dielectric constants of the derived samples decrease with the increase in frequency. The ac-conductivity in the samples increases with the increase in frequency irrespective of Ti concentration and shows significant drop with the increase in Ti concentration at all frequencies.
- OSTI ID:
- 22606526
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1728; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CONCENTRATION RATIO
CORRELATIONS
DIELECTRIC MATERIALS
FOURIER TRANSFORM SPECTROMETERS
FOURIER TRANSFORMATION
HAFNIUM OXIDES
HYDROFLUORIC ACID
IMPEDANCE
INFRARED SPECTRA
MICROSTRUCTURE
NANOPARTICLES
PERMITTIVITY
RESOLUTION
TEMPERATURE RANGE 0273-0400 K
TITANIUM ADDITIONS
TRANSMISSION
TRANSMISSION ELECTRON MICROSCOPY
X RADIATION
X-RAY DIFFRACTION