Measurement of electron density using reactance cutoff probe
- Center for Vacuum Technology, Korea Research Institute of Standards and Science, Daejeon 34113 (Korea, Republic of)
- Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejeon 34141 (Korea, Republic of)
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 34141 (Korea, Republic of)
This paper proposes a new measurement method of electron density using the reactance spectrum of the plasma in the cutoff probe system instead of the transmission spectrum. The highly accurate reactance spectrum of the plasma-cutoff probe system, as expected from previous circuit simulations [Kim et al., Appl. Phys. Lett. 99, 131502 (2011)], was measured using the full two-port error correction and automatic port extension methods of the network analyzer. The electron density can be obtained from the analysis of the measured reactance spectrum, based on circuit modeling. According to the circuit simulation results, the reactance cutoff probe can measure the electron density more precisely than the previous cutoff probe at low densities or at higher pressure. The obtained results for the electron density are presented and discussed for a wide range of experimental conditions, and this method is compared with previous methods (a cutoff probe using the transmission spectrum and a single Langmuir probe).
- OSTI ID:
- 22600104
- Journal Information:
- Physics of Plasmas, Vol. 23, Issue 5; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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