Effect of annealing on the laser induced damage of polished and CO{sub 2} laser-processed fused silica surfaces
- CEA-CESTA, 15 Avenue des Sablières, CS 60001, F33116 Le Barp Cedex (France)
We investigate the effect of different heat treatments on the laser-induced damage probabilities of fused silica samples. Isothermal annealing in a furnace is applied, with different temperatures in the range 700–1100 °C and 12 h annealing time, to super-polished fused silica samples. The surface flatness and laser damage probabilities at 3 ns, 351 nm are measured before and after the different annealing procedures. We have found a significant improvement of the initial laser damage probabilities of the silica surface after annealing at 1050 °C for 12 h. A similar study has been conducted on CO{sub 2} laser-processed sites on the surface of the samples. Before and after annealing, we have studied the morphology of the sites, the evolution of residual stress, and the laser-induced damage threshold measured at 351 nm, 3 ns. In this case, we observe that the laser damage resistance of the laser created craters can reach the damage level of the bare fused silica surface after the annealing process, with a complete stress relieve. The obtained results are then compared to the case of local annealing process by CO{sub 2} laser irradiation during 1 s, and we found similar improvements in both cases. The different results obtained in the study are compared to numerical simulations made with a thermo-mechanical model based on finite-element method that allows the simulation of the isothermal or the local annealing process, the evolution of stress and fictive temperature. The simulation results were found to be very consistent with experimental observations for the stresses evolution after annealing and estimation of the heat affected area during laser-processing based on the density dependence with fictive temperature. Following this work, the temperature for local annealing should reach 1330–1470 °C for an optimized reduction of damage probability and be below the threshold for material removal, whereas furnace annealing should be kept below the annealing point to avoid sample deformation.
- OSTI ID:
- 22596742
- Journal Information:
- Journal of Applied Physics, Vol. 119, Issue 21; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Thermal annealing of laser damage precursors on fused silica surfaces
Laser induced damage of fused silica polished optics due to a droplet forming organic contaminant
Related Subjects
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANNEALING
CARBON DIOXIDE
CARBON DIOXIDE LASERS
COMPARATIVE EVALUATIONS
COMPUTERIZED SIMULATION
DAMAGE
DEFORMATION
FINITE ELEMENT METHOD
HEAT
LASER RADIATION
MORPHOLOGY
PROBABILITY
RESIDUAL STRESSES
SILICA
SURFACES
TEMPERATURE RANGE 1000-4000 K