Kapitza thermal resistance studied by high-frequency photothermal radiometry
- Multiscale Thermophysics Lab. GRESPI, Université de Reims Champagne Ardenne URCA, Moulin de la Housse, BP 1039, 51687 Reims (France)
- Mechanical and Aerospace Engineering (MAE), Utah State University, 4130 Old Main Hill, Logan, Utah 84322-4130 (United States)
Kapitza thermal resistance is determined using high-frequency photothermal radiometry (PTR) extended for modulation up to 10 MHz. Interfaces between 50 nm thick titanium coatings and silicon or stainless steel substrates are studied. In the used configuration, the PTR signal is not sensitive to the thermal conductivity of the film nor to its optical absorption coefficient, thus the Kapitza resistance is directly determined from single thermal parameter fits. Results of thermal resistances show the significant influence of the nature of the substrate, as well as of the presence of free electrons at the interface.
- OSTI ID:
- 22594475
- Journal Information:
- Applied Physics Letters, Vol. 109, Issue 3; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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