Nanosized graphene sheets enhanced photoelectric behavior of carbon film on p-silicon substrate

Journal Article · Mon Jul 18 00:00:00 EDT 2016 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4959563· OSTI ID:22594416

Yang, Lei; Hu, Gaijuan; Zhang, Dongqing ^[1]; Diao, Dongfeng ^[2]

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1. Key Laboratory of Education Ministry for Modern Design and Rotor-Bearing System, School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an 710049 (China)
2. Institute of Nanosurface Science and Engineering (INSE), Shenzhen University, Shenzhen 518060 (China)

We found that nanosized graphene sheets enhanced the photoelectric behavior of graphene sheets embedded carbon (GSEC) film on p-silicon substrate, which was deposited under low energy electron irradiation in electron cyclotron resonance plasma. The GSEC/p-Si photodiode exhibited good photoelectric performance with photoresponsivity of 206 mA/W, rise and fall time of 2.2, and 4.3 μs for near-infrared (850 nm) light. The origin of the strong photoelectric behavior of GSEC film was ascribed to the appearance of graphene nanosheets, which led to higher barrier height and photoexcited electron-collection efficiency. This finding indicates that GSEC film has the potential for photoelectric applications.

• OSTI ID: 22594416
• Journal Information: Applied Physics Letters, Vol. 109, Issue 3; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CYCLOTRONS
DEPOSITS
EFFICIENCY
ELECTRON CYCLOTRON-RESONANCE
ELECTRONS
FILMS
GRAPHENE
IRRADIATION
NANOSTRUCTURES
PHOTODIODES
PLASMA
SHEETS
SILICON
SUBSTRATES