skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Extended hot carrier lifetimes observed in bulk In{sub 0.265±0.02}Ga{sub 0.735}N under high-density photoexcitation

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4945594· OSTI ID:22591501
; ; ; ; ; ; ; ; ; ;  [1];  [2];  [3]; ;  [4];  [5]
  1. School of Photovoltaic and Renewable Energy Engineering, UNSW, Sydney 2052 (Australia)
  2. School of Chemistry, The University of Sydney, Sydney 2006 (Australia)
  3. Max Planck Institute for the Science of Light, Günther-Scharowsky-Str. 1, 91058 Erlangen (Germany)
  4. Chemistry Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)
  5. School of Chemistry, UNSW, Sydney 2052 (Australia)

We have investigated the ultrafast carrier dynamics in a 1 μm bulk In{sub 0.265}Ga{sub 0.735}N thin film grown using energetic neutral atom-beam lithography/epitaxy molecular beam epitaxy. Cathodoluminescence and X-ray diffraction experiments are used to observe the existence of indium-rich domains in the sample. These domains give rise to a second carrier population and bi-exponential carrier cooling is observed with characteristic lifetimes of 1.6 and 14 ps at a carrier density of 1.3 × 10{sup 16 }cm{sup −3}. A combination of band-filling, screening, and hot-phonon effects gives rise to a two-fold enhanced mono-exponential cooling rate of 28 ps at a carrier density of 8.4 × 10{sup 18 }cm{sup −3}. This is the longest carrier thermalization time observed in bulk InGaN alloys to date.

OSTI ID:
22591501
Journal Information:
Applied Physics Letters, Vol. 108, Issue 13; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English