Preparation and atomic force microscopy of CTAB stabilized polythiophene nanoparticles thin film

Journal Article · Fri May 06 00:00:00 EDT 2016 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4946099· OSTI ID:22591246

Graak, Pinki; Devi, Ranjna; Kumar, Dinesh; Kumar, Sacheen ^[1]; Singh, Vishal ^[2]

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1. Department of Electronic Science, Kurukshetra University, Kurukshetra, Haryana, India -136119 (India)
2. Centre for Material Science and Engineering, National Institute of Technology, Hamirpur, H.P. (India)

Polythiophene nanoparticles were synthesized by iron catalyzed oxidative polymerization method. Polythiophene formation was detected by UV-Visible spectroscopy with λmax 375nm. Thin films of CTAB stabilized polythiophene nanoparticles was deposited on n-type silicon wafer by spin coating technique at 3000rpm in three cycles. Thickness of the thin films was computed as 300-350nm by ellipsometry. Atomic force micrscopyrevealws the particle size of polymeric nanoparticles in the range of 30nm to 100nm. Roughness of thinfilm was also analyzed from the atomic force microscopy data by Picoimage software. The observed RMS value lies in the range of 6 nm to 12 nm.

• OSTI ID: 22591246
• Journal Information: AIP Conference Proceedings, Vol. 1728, Issue 1; Conference: ICC 2015: International conference on condensed matter and applied physics, Bikaner (India), 30-31 Oct 2015; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABSORPTION SPECTROSCOPY
ATOMIC FORCE MICROSCOPY
ELLIPSOMETRY
IRON
NANOPARTICLES
N-TYPE CONDUCTORS
ORGANIC POLYMERS
OXIDATION
PARTICLE SIZE
POLYMERIZATION
ROUGHNESS
SILICON
SPIN-ON COATING
THIN FILMS
THIOPHENE