Laser generation of XeCl exciplex molecules in a longitudinal repetitively pulsed discharge in a Xe – CsCl mixture

Journal Article · Thu Dec 31 04:00:00 EST 2015 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QE2015V045N12ABEH015859· OSTI ID:22551133

Boichenko, A M ^[1]; Klenovskii, M S ^[2]

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1. A M Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)
2. National Research Tomsk Polytechnic University, Tomsk (Russian Federation)

By using the previously developed kinetic model, we have carried out simulations to study the possibility of laser generation of XeCl exciplex molecules in the working medium based on a mixture of Xe with CsCl vapours, excited by a longitudinal repetitively pulsed discharge. The formation mechanism of exciplex molecules in this mixture is fundamentally different from the formation mechanisms in the traditional mixtures of exciplex lasers. The conditions that make the laser generation possible are discussed. For these conditions, with allowance for available specific experimental conditions of the repetitively pulsed discharge excitation, we have obtained the calculated dependences of the power and efficiency of generation on the reflectivity of mirrors in a laser cavity. (active media)

• OSTI ID: 22551133
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Journal Name: Quantum Electronics (Woodbury, N.Y.) Journal Issue: 12 Vol. 45; ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

74 ATOMIC AND MOLECULAR PHYSICS
CESIUM CHLORIDES
ELECTRIC DISCHARGES
EXCITATION
LASER CAVITIES
LASERS
MIXTURES
MOLECULES
PULSES
REFLECTIVITY
SIMULATION
XENON
XENON CHLORIDES