Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

Journal Article · Tue Sep 01 00:00:00 EDT 2015 · APL Materials

DOI:https://doi.org/10.1063/1.4931080· OSTI ID:22499241

Oguchi, Hiroyuki ^[1]; Isobe, Shigehito ^[2]; Kuwano, Hiroki ^[1]; Shiraki, Susumu; Hitosugi, Taro ^[3]; Orimo, Shin-ichi ^[3]

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1. Department of Nanomechanics, Tohoku University, Sendai 980-8579 (Japan)
2. Creative Research Institution, Hokkaido University, Sapporo 001-0021 (Japan)
3. Advanced Institute for Materials Research (AIMR), Tohoku University, Sendai 980-8577 (Japan)

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250 °C under a hydrogen pressure of 1.3 × 10{sup −2} Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness R{sub RMS} of ∼0.4 nm.

• OSTI ID: 22499241
• Journal Information: APL Materials, Journal Name: APL Materials Journal Issue: 9 Vol. 3; ISSN 2166-532X; ISSN AMPADS
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ATOMIC FORCE MICROSCOPY
ENERGY BEAM DEPOSITION
EPITAXY
LASER RADIATION
LITHIUM HYDRIDES
MAGNESIUM OXIDES
PULSED IRRADIATION
SUBSTRATES
SURFACES
THIN FILMS